Welcome to the CIBA Process website. At CIBA (Centre for Ion Beam Applications) we have developed a process for micromachining silicon, porous silicon and glass in two and three dimensions, allowing both surface patterned and genuine 3D microstructures to be fabricated.

The process is based on high-energy ion irradiation, followed by electrochemical anodization and then removal of porous silicon and/or high temperature oxidation. We have been working on understanding and optimizing the basic science underlying this process for several years and this website describes each fabrication stage involved. Various applications in optics, photonics, microfluidics, MEMS, nanoscale surface patterning and nanostencil technology are also briefly described.

To find out more about this process and how it may be used in your work, please contact:

Mark Breese: